Elimination of Pinhole Defects in Self-Aligned Double Patterning Process by using Bias Pulsed Plasma
Abstract: Self-aligned double patterning (SADP) is extensively utilized in advanced sub-20nm technology nodes. The DRAM digit contact SADP dry etch process experienced severe yield loss due to pinhole ...
Thermal Conversion GUI is an open-source tool that automates conversion of DJI radiometric R-JPEG thermal images into georeferenced, radiometrically-correct TIFF files suitable for GIS and ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results